STA之RC Corner

 

 

RC corner,这里的RC指gate跟network的寄生参数,寄生参数抽取工具根据电路的物理信息,抽取出电路的电阻电容值,再以寄生参数文件输入给STA工具,常见的寄生参数文件格式为SPEF。

 

STA之RC Corner_第1张图片

 

 

ICer都知道在集成电路中是多层走线的,专业术语叫metal layer,不同工艺有不同层metal layer,任何两层metal layer间由介电材料隔离,『走线』通过过孔(VIA)连接。Width跟Spacing是衡量绕线的两条最重要的物理设计规则,它们随着工艺的进步逐步减小。 介电材料、绕线材料、线间距、线宽及线的厚度这些物理特性决定了network的RC值。

 

STA之RC Corner_第2张图片

Network电容:

  • 耦合电容:Coupling  capacitance=e*T/S

  • 表面电容:Surface capcitance=e*W/H

  • 边缘电容:Fringe capcitance

决定容值的因素:

  • 介电常数:e

  • 线宽:W

  • 线厚:T

  • 线间距:S

  • 介电材料的厚度:H

随着工艺进步,W, S, T 逐代递减,表面电容跟随减小,耦合电容随之增加,耦合电容在总电容中占比增加,当线厚 T 一定时为了减少耦合电容要么增加线间距要么减小介电常数。通常为了减小噪声敏感信号线(如clock net)上的耦合电容,在物理实现时会人为增加对应信号的线宽及线间距,俗称NDR。要减小介电常数需要从材料入手,从 .18开始引入low K介电材料。

Network电阻:

R=r/W*T, r为电阻率,除了跟线宽 W 和线厚 T 相关之外,还跟温度相关,随着温度的上升而增大。

STA之RC Corner_第3张图片

 

 

由上面的分析可知,Network的单位电容和单位电阻是不可能同时最大或同时最小的。有了这些铺垫,来看一下不同工艺结点是如何定义RC corner的。

 

90nm 之前,Cell delay占主导,Network电容主要是对地电容,STA只需要两个RC corner即可:

  • Cbest(Cmin): 电容最小电阻最大

  • Cworst(Cmax):电容最大电阻最小

90nm 之后,netdelay的比重越来越大,而且network的耦合电容不可忽略,所以又增加了两个RC corner:

  • RCbest(XTALK corner): 耦合电容最大,(对地电容*电阻)最小

  • RCworst(Delay corner): 耦合电容最小,(对地电容*电阻)最大

STA之RC Corner_第4张图片

 

 

至此总共有两个需要setup timing sign-off的RC corner,有四个需要hold timing sign-off的RC corner:

 

  • Setup time sign-off 的RC corner是: Cworst / RCworst

  • Hold time sign-off 的RC corner是: Cbest / RCbest / Cworst / RCworst

 

C-best:

  • It hasminimum capacitance. So also known as Cmin corner.

  • InterconnectResistance is larger than the Typical corner.

  • Thiscorner results in smallest delay for paths with short nets and can be used formin-path-analysis.

C-worst:

  • Refers tocorners which results maximum Capacitance. So also known as Cmax corner.

  • Interconnectresistance is smaller than at typical corner.

  • Thiscorners results in largest delay for paths with shorts nets and can be used formax-path-analysis.

RC-best:

  • Refers tothe corners which minimize interconnect RC product. So also known as RC-mincorner.

  • Typicallycorresponds to smaller etch which increases the trace width. This results insmallest resistance but corresponds to larger than typical capacitance.

  • Corner hassmallest path delay for paths with long interconnects and can be used formin-path-analysis.

RC-worst:

  • Refers tothe corners which maximize interconnect RC product. So also known as RC-maxcorner.

  • Typicallycorresponds to larger etch which reduces the trace width. This results inlargest resistance but corresponds to smaller than typical capacitance.

  • Corner haslargest path delay for paths with long interconnects and can be used formax-path-analysis.

STA之RC Corner_第5张图片

引入的DPT(Double Patterning Technology)之后,在同一层layer上要做两次mask,两次mask之间的偏差,会导致线间距变化,从而影响耦合电容值,需要将这一因素考虑到RC corner中,所以DPT 的RC corner是:Cworst_CCworst, RCworst_CCworst, Cbest_CCbest, RCbest_CCbest.

STA之RC Corner_第6张图片

 

 

其中: 

  • Setup timesign-off 的RC corner是: Cworst_CCworst / RCworst_CCworst

  • Hold timesign-off 的RC corner是: Cbest_CCbest / RCbest_CCbest / Cworst_CCworst /RCworst_CCworst

 

STA之RC Corner_第7张图片

 

 除以上这些corner外,还有一个corner叫Typical corner,对应于DPT的是Ctypical_CCworst, Ctypical_CCbest,这些corner不用于timing sign-off。

转载于:https://www.cnblogs.com/lelin/p/11421362.html

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