毕设顺便攒的英文表达

表达式

  • w tilde
  • hat y
  • x dagger

行文

  • w.r.t = with regard to = about
  • peculiar aspects
  • not easily extendable to other devices
  • corpuscular 微小的 重音2
  • The following paragraphs will deal with those issues in detail.
  • simplified and tractable model of the actual device
  • a top view of the device 俯视图
  • The contacts extend over areas of few thousand um2. 接触的面积
  • The separation between S and D is a few um. 距离
  • There's no significant variation of physical quantity along the direction perpendicular to the x-y plane.
  • spatial inhomogenities along the z direction
  • The barrier is reduced when a positive bias is applied to the semiconductor and it is increased for the opposite polarity.
  • The sum is over the mesh points / super-particles.
  • reproduce the physical reality
  • accuracy of the results VS the cost effectiveness of the algorithm
  • by varing the gate and drain bias 改变电压 vary the bias
  • By collecting the above results, we have ... 整理上面的公式可以得到
  • This section surveys the history of instruction set architectures (ISAs) over time.
  • one can readily argue that
  • the research on xxx was shrunk. 研究变少
  • Rapid progress in xxx was promptly followed by xxxx.
  • Raison d'etre 存在的理由
  • The Ge- and Si-based technologies were spawned in 1947 by the demonstration of the first transistor. 雨后春笋般出现

几个容易忘记的点

金属半导体接触
  • 外加电压是调整半导体一侧的电压降,金属一侧认为没有电压降
  • 真空能级连续,但是不是constant,电子亲和能是不变的,所以真空能级也相应弯曲。
  • J = Js * [exp(qv/nkT) - 1] 低掺杂时,Js是常量,n接近1;掺杂浓度提高,I-V曲线就越发不像pn结了。
  • 电流类型四种


    毕设顺便攒的英文表达_第1张图片
MESFET
  • GaAs不做MOSFET,因为表面态太大了。Si不怎么做MESFET,因为允许加的电势太小??
  • unipolar device
  • 一种 JFET(另一种是PNJFET)
  • epitaxial layer of GaAs 掺杂浓度一般为 10^17 cm-3,长在semi-insulating GaAs substrate上。
GaAs
  • Drift velocity VS field curve presents a maximum at fields around 3 kV/cm at room temperature.

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